Formation of C-N-Si Film for Interlayer of Hard Material Coating by Pulsed Discharge Plasma CVD
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چکیده
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2013
ISSN: 1742-6596
DOI: 10.1088/1742-6596/417/1/012045